About:
This semiconductor research institute is conducting next-generation semiconductor equipment, ALD (CVD) & Metal processes, and Dry-PR research/development for EUV. In addition, it is researching and developing materials/application technologies required for element technologies (Valve, Heat Jacket, Remote-Plasma, VUV…) used in semiconductor components.
Education:
22.03 ~ 2024.08 Yonsei University Department of Electronic Engineering Doctor
90.03~ 1992.06 KwangWoon University Department of Electronic materials Master
86.03 ~1990.02 KwangWoon University Department of Electronic materials B.S.
Experience:
24, 03 ~ Gachon University, Department of Semiconductor Display Semiconductor
Fabrication, Process, Equipment Department Professor
13.10 ~ 2024.02 WonickIPS Co., Ltd R&D Center EVP
04.04 ~2013.03 Applied Materials in USA R&D Center R&D Center Sr. Director
92.06 ~ 2004.03 Samsung Electronics Co., Ltd Semiconductor Division
Honors & Specialities:
26.03 Effect of W nucleation process on the adhesion of W/TiN/SiO2structures for BEOL interconnects
24.06 Synthesis of high conformalty Ti-Six-N films using (CH3)3CCl and SiH4; density functional theory simulation and film characterization
23.02 Super-conformal TiN thin film deposition by carrier pulse purge atomic layer deposition system: Chamber design optimization with computational fluid dynamics
23.10 Synthesis of highly conformal titanium nitride films via tert-butyl chloride-assisted atomic layer deposition
21.09 반도체 소자용 그래핀 배리어 박막 증착 방법(Graphene barrier thin film deposition method for semiconductor device)
21.08 기판 처리 방법(Method of processing substrate)
12.12 박막 형성 방법(Method of depositing thin film)
09.09 낮은 에칭 레이트 유전체 라이너들을 이용한 갭충진 향상(GAPFILL IMPROVEMENT WITH LOW ETCH RATE DIELECTRIC LINERS)
04.10 히팅 장치가 구비된 웨이퍼 트랜스퍼용 로봇 패들을 갖는반도체 제조 설비(SEMICONDUCTOR MANUFACTURING APPARATUS EQUIPPED WITHROBOT PADDLE USED FOR WAFER TRANSFER HAVING HEATER)
02.04 반도체장치 및 그의 제조 방법(SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THESAME)
01.03 디클로로 실란의 이상성장 제어가 가능한 두개의 층을갖는 반도체 박막형성방법(CONTROL OF ABNORMAL GROWTH IN DICHLORO SILANE(DCS)BASED CVD POLYCIDE WSix FILMS)
01.04 절연막 제조 방법 및 반도체 장치의 제조 방법(Method of manufacturing an insulator layer and asemiconductor device)
00.12 반도체 소자의 절연막 형성방법(Method for fabricating insalating film ofsemiconductor device)
